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PROCESS & EQUIPMENT I
Title
Description
Objective
Link
How a CMOS
Device Works
An animation of how a CMOS device Works.
Identify the required electrical variables that allow a CMOS device to operate.

n-Channel Enhancement MOSFET Characteristic Curves

This is an animation of a n-Channel Enhancement MOSFET Characteristic Curves.
Determine the active non-active operation regions of an n-Channel MOSFET gate.

The Making of the CMOS Microchip

How a CMOS Microchip is made.
Determine the process steps needed to complete a CMOS device.

The Deposition Process

An animation of the chemical vapor deposition process.
Identify the process of chemical vapor deposition.

Workflow in
the CVD Tool

Animation of Workflow in the CVD Tool.
The steps in the CVD process cycle will be a unique step in the recipe. There may be more steps, or minor variations, but most CVD process recipes will look very similar to the sequence below and illustrated in the animation repeated here for review.

PROCESS & EQUIPMENT II
Title
Description
Objective
Link

Etch Process

Animation shows the plasma etching of silicon dioxide. In this type of plasma etching process Chlorine gas and Argon gas mixture is used. The Chlorine gas neutral charge molecules bond with the surface silicon dioxide molecules and create silicon chloride molecule. Through the bombardment of the plasma charged Argon molecules the silicon chloride molecules are
released from the surface layer. The etch continues till the exposed silicon dioxide material is removed.
Describe the etch process in detail.

How a Plasma
Etcher Works

Animation of how a Plasma Etcher works.
Describe all the steps used to load, etch, and unload a wafer from a plasma etcher.

Metallization: Evaporation

Animation overview of the Evaporation processes.
Identify the process of evaporation.

Metallization:
Sputtering

Animation overview of the Sputtering processes.
Idenitify the process of sputtering.

QUALITY MANAGEMENT & CONTROL
Title
Description
Objective
Link

Dressing for Work in
the Cleanroom-Video

A video is presented in which a technician at a semiconductor fab explains the gowning procedure she uses at work.
Justify the personal hygiene standards of cleanroom employees. Select appropriate garments for cleanroom classification. Identify the appropriate sequence for donning cleanroom apparel. Identify the appropriate sequence for removing cleanroom apparel. Develop a code of behavior that includes care in donning and wearing cleanroom apparel.

PROCESS & EQUIPMENT III
Title
Description
Objective
Link

The Diffusion Process

The two models that have been developed to explain the mechanism for the diffusion of dopants into silicon are the vacancy model and the interstitial model. It is the different bonding characteristics of the dopants with silicon that determine the diffusion mechanism. Although each model is based on these differences, they are not mutually exclusive.
Explain the difference between Vacancy and Intersititial.

Ion Implant

This animation is an overview of the implant process.
Name the three common dopants used in implantation processes and explain the process of generating an ion beam from source to wafer.

Ion Implant
Pinball Game

The magnetic force of the ions can be compared to a pinball machine with three different masses. If the same impulse is applied to each ball, only the one with the ideal mass will "hit" the target.
Describe how the mass affects implantation.

Chemical Mechanical Planarization - Chemical

The chemical action of slurry can be seen in the following animation.
Explain the mechanical and chemical steps in the CMP process.

Chemical Mechanical Planarization - Multilayer Planarization

There are many different ways in which the dual damascene process is used. The animation shows an overview of one process: -In the dual damascene process, a low-k dielectric is added. CMP is used to remove dielectric down to depth of the vias. -Silicon nitride is deposited and the resist is added and exposed. The surface is etched and a second layer of low-k dielectric is added. -CMP is used to remove the dielectric down to the final thickness of the metal lines. Resist is added for vias and metal lines. The surface is exposed and removed. The dielectric is etched and the resist is removed. The metal barrier and metal are added. -Depending on the process, this could be copper. The metal and metal barrier are removed through CMP.
Explain the dual damascene process.

Chemical Mechanical Planarization Simulation

In the simulation you will use controls (drop down menus) to adjust down force and platen speed parameters to determine an optimum CMP process recipe for Focal Semiconductor Manufacturing. You may assume that Focal is using a rotational tool with on-the-pad slurry delivery and wafer/polish pressure is through the carrier. You will keep track of your "test runs" in separated tables, one for down force and one for platen speed. Once you've observed the effect of the parameters on wafer thickness and uniformity. Finally, you will make predictions about the necessary settings for achieving a prescribed WIWNU goal.
Solve for removal rate in a simulated CMP process. Adjust planarization equipment process parameters to determine the optimal values needed to achieve the processing objectives in a simulated CMP process. Estimate control parameter settings in a CMP recipe simulation for optimal WIWNU and removal rate.

Workflow in the Planarization Tool

Animation of the workflow in the planarization tool.
Describe the workflow of a planarization workstation.

From Wafer to Package

Animation of finished wafer to packaged integrated Circuits.
Describe the wafer to packaged device process steps.

VACUUM TECHNOLOGY & GAS CONTROLS
Title
Description
Objective
Link

Five Stages of Flow

This animation shows the stages that molecules go through as they move from the turbulent stage of viscous flow, transition into laminar flow, and then transition again into molecular flow. You may pause this animation between stages.
Idenitify the five stages of flow.

Rotary Vane Pump

The animation of a rotary vane pump.
Describe the rotary vane pump operation.

Mechanical
Booster Pump

The animation of a mechanical booster (rotary lobe) pump.
Describe the components and operation of a mechanical booster pump (Roots Blower).

Rotary Piston Pump

The animation of a rotary piston pump.
Describe the rotary piston pump operation.

Bourdon Tube Gauge

A Bourdon tube gauge animation.
Describe how a Bourdon Tube Gauge measures vacuum.

Leak Dectection Simulator

In the simulator, you will perform the vacuum testing ("outside-in") method of leak detection with a mass spectrometer leak detector. You will control a helium spray probe and monitor a readout for the presence of helium entering a vacuum system through a leak site randomly selected by the program. You must make a correct determination of a leak (i.e., its existence and location) as quickly as possible.  When you have indicated your determination, the program will provide feedback. A correct decision will allow you to print a report of your success for your instructor.  An incorrect decision will require you to keep searching.
Determine the location of a leak using a mass spectrometer leak detector.

Mass Flow Controller

Animation for a view of the MFC in operation; be sure to click on the "more info" buttons within the animation.
Describe the operation of the MFC.

RF ENERGY & PLASMA TECHNOLOGY
Title
Description
Objective
Link

RF Energy Animation

How RF energy creates the desired conditions for plasma.
Draw an RF generator circuit and show polarization effect on ions in a vacuum chamber.

RF Energy Simulation

In the simulation that follows, AC power will be used to create RF plasma. RF plasma also exhibit glow regions, dark spaces, and sheaths.
Explain the relationship between pressure and energy for initializing a plasma.

Efficiency and Power

The following animation shows how a load resistance results in increase in output power. Use the up and down arrow keys to change the load resistance, RL. While viewing, note the following: Power output peaks when load resistance equals generator resistance. Further increases in load resistance results in lower output power
Describe the optimum load versus power settings for transfer of RF Energy.

Efficiency and Power Simulation

The following animation shows how a load resistance results in increase in output power. Use the up and down arrow keys to change the load resistance, RL. While viewing, note the following:
- Power output peaks when load resistance equals generator resistance.
- Further increases in load resistance results in lower output power.

Describe the optimum load versus power settings for transfer of RF Energy.

AUTOMATION TECHNOLOGY
Title
Description
Objective
Link

Single Action
Rod System

This animation is of a pneumatic actuator system - computer, communication center, valve, and an actuator (single piston rod). Clicking on each system component will bring up the individual component and its function. Clicking the animate button (what is the button?) will animate and provide a
description of the whole system working together.
Describe each component of a pneumatic actuator system and their function. Describe how the whole system works together.

Double Action Gripper

A cut-away animation of a pnuematic double action gripper.
Describe how a double action gripper works.

Dual Rod Cylinder

A cut-away animation of a pnuematic duel rod cylinder.
Describe how a dual rod cylinder works.

Dual Rod
Cylinder System

A cut-away animation of a pnuematic duel rod cylinder system.
Describe how a dual rod cylinder system works.

Guided Vacuum
Pickup Cylinder

A cut-away animation of a guided vacuum pickup cylinder.
Describe how a guided vacuum pickup cylinder works.

90 degree Rotary Table

A cut-away animation of a pnuematic 90 degree rotary table.
Describe how a 90 degree rotary table works.

180 degree
Rotary Table

A cut-away animation of a pnuematic 180 degree rotary table.
Describe how a 180 degree rotary table works.

Single Action Gripper

A cut-away animation of a pnuematic single action gripper.
Describe how a single action gripper works.

Uniaxial Electric Actuator

A cut-away animation of a pnuematic actuator.
Describe how a uniaxial electric actuator works.

Networking Computers

A basic overview of the type of networks a computer can be part of.
Understand the different types of computer networks.

Computer Communication

A basic overview of different computer communication and manufacturing.
Understand the different types of computer communication there are.

Compressed Air

A basic overview of compressed air for
use in machines.
Describe the different tools that can be
used with compressed air.

Pneumatic Valves & Pneumatic Cylinders

A basic overview of pneumatic valves and pneumatic cylinders.
Describe the different pneumatic valves
and cylinders.

Human Machine Interface

A basic overview of human machine interface.
Define Human Machine Interface.
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Conditions for use:  The animations are © copyrighted & useable within the fair use provisions of the copyright law.
All rights reserved ®.


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